Direct write lithography system

Details Direct write lithography system Direct write lithography system

2005-07-19

2005-07-19

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S068000

Reexamination Certificate

active

06919952

ABSTRACT:
The mask-less lithography system has a converter that includes an array of light controllable electron sources. Each electron source is arranged for converting light into an electron beam and has an activation area. Individually controllable light sources are included where each light source is arranged for activating one electron source. A Controller controls each light source individually and each electron beam is focused on an object plane with a diameter smaller than the diameter of an individually controllable light source.

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patent: 6724002 (2004-04-01), Mankos et al.
patent: 2003/0002024 (2003-01-01), Motegi
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patent: 2164787 (1985-09-01), None
patent: WO 03/017317 (2003-02-01), None

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