Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2006-02-21
2006-02-21
Bueker, Richard (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S726000
Reexamination Certificate
active
07001467
ABSTRACT:
A device and method for depositing a material of interest onto a receiving substrate includes a first laser and a second laser, a receiving substrate, and a target substrate. The target substrate comprises a laser transparent support having a back surface and a front surface. The front surface has a coating that comprises the source material, which is a material that can be transformed into the material of interest. The first laser can be positioned in relation to the target substrate so that a laser beam is directed through the back surface of the target substrate and through the laser-transparent support to strike the coating at a defined location with sufficient energy to remove and lift the source material from the surface of the support. The receiving substrate can be positioned in a spaced relation to the target substrate so that the source material is deposited at a defined location on the receiving substrate. The second laser is then positioned to strike the deposited source material to transform the source material into the material of interest.
REFERENCES:
patent: 4716270 (1987-12-01), Gnanamuthu et al.
patent: 5292559 (1994-03-01), Joyce et al.
patent: 5725914 (1998-03-01), Opower
patent: 6099626 (2000-08-01), Hirano et al.
Auyeung Raymond
Chrisey Douglas B.
Fitzgerald James
Pique Alberto
Wu Huey-Daw
Bueker Richard
Grunkemeyer Joe
Karasel John J.
The United States of America as represented by the Secretary of
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