Direct wafer temperature control

Details Direct wafer temperature control Direct wafer temperature control

1987-03-02

1988-11-29

Goldberg, E. A.

Electric heating

Heating devices

With current connection and/or disconnection means

118 50, H05B 102

Patent

active

047884169

ABSTRACT:
The temperature of a wafer in a vacuum chamber is measured by way of a tube, containing a thermocouple, extending through a wall of the chamber. The tube is sealed at one end to an aperture in the wall of the system and sealed at the other end with removable sealant.

REFERENCES:
patent: 3051813 (1962-08-01), Busch et al.
patent: 3754118 (1973-08-01), Booker

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