Chemistry of inorganic compounds – Oxygen or compound thereof – Peroxide
Reexamination Certificate
2006-09-12
2006-09-12
Langel, Wayne A. (Department: 1754)
Chemistry of inorganic compounds
Oxygen or compound thereof
Peroxide
Reexamination Certificate
active
07105142
ABSTRACT:
A process is described for the production of hydrogen peroxide from hydrogen and oxygen in a reaction solvent containing a halogenated promoter and/or an acid promoter, in the presence of a heterogeneous catalyst based on one or more metals of the platinum group, wherein the reaction solvent consists of: (1) an alcohol or mixture of alcohols; (2) an aliphatic ether having general formula (I); and (3) optionally water. The solvent mixture may also contain one or more C5–C32hydrocarbons. The process operates under high safety conditions with a high productivity and molar selectivity towards the formation of H2O2.
REFERENCES:
patent: 3361533 (1968-01-01), Hooper
patent: 4335092 (1982-06-01), Dalton, Jr. et al.
patent: 4336238 (1982-06-01), Dalton, Jr. et al.
patent: 5783164 (1998-07-01), Bianchi et al.
patent: 5965101 (1999-10-01), Goto et al.
patent: 6468496 (2002-10-01), Jones et al.
patent: 6534661 (2003-03-01), Zhou et al.
patent: 6630118 (2003-10-01), Paparatto et al.
patent: 2002/0106320 (2002-08-01), Zhou et al.
patent: 0 787 681 (1997-08-01), None
patent: 0 978 316 (2000-02-01), None
patent: 1 056 125 (1967-01-01), None
patent: 98 16463 (1998-04-01), None
D'Aloisio Rino
De Alberti Giordano
Paparatto Giuseppe
Eni S.p.A.
Langel Wayne A.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Polimeri Europa S.p.A.
LandOfFree
Direct synthesis of hydrogen peroxide in a multicomponent... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Direct synthesis of hydrogen peroxide in a multicomponent..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Direct synthesis of hydrogen peroxide in a multicomponent... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3581187