Direct reversal silver halide photographic light-sensitive mater

Details Direct reversal silver halide photographic light-sensitive mater Direct reversal silver halide photographic light-sensitive mater

1985-11-21

1988-07-12

Louie, Won H.

Radiation imagery chemistry: process, composition, or product th

Post imaging processing

Positive

430597, 430594, G03C 1485, G03C 524

Patent

active

047569956

ABSTRACT:
A direct reversal silver halide photographic light-sensitive material is disclosed. The material is comprised of a support having thereon a silver halide emulsion layer having silver halide grains, the surface of which is preliminarily fogged, rhodium as a desensitizer, and a dye having an absorption maximum within the range of from 470 to 520 nm. The dye is represented by the general formula (I): ##STR1## The substituents within general formula (I) are defined in the specification. The material has improved safety with respect to visible safe light and does not suffer color stain after photographic development processing. Further, the dye is stable in a solution state during processing.

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