Direct positive silver halide photographic light-sensitive mater

Details Direct positive silver halide photographic light-sensitive mater Direct positive silver halide photographic light-sensitive mater

1990-06-04

1991-09-17

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Silver compound sensitizer containing

430510, 430596, 430606, 430611, 430613, 430631, 430633, 430635, 430636, 430567, 430940, 430963, G03C 1485

Patent

active

050494830

ABSTRACT:
There is disclosed a direct positive silver halide light-sensitive material which can be processed in ultra-rapid processing and have a higher sensitivity, a lower Dmin, an excellent antistatic property and less flactuation of the properties in storing. The light-sensitive material contains an electron-accepting compound in a silver halide emulsion layer, and a fluorinated surfactant and/or at least one of the compounds represented by Formulas I-a to II-b in a photographic component layer: ##STR1## wherein R.sub.1 to R.sub.4 represent independently a hydrogen atom, a lower alkyl group, an alkoxy group, a carboxy group, an alkoxycarbonyl group, a sulfo group, a halogen atom, and a nitro group, provided that at least one of R.sub.1 and R.sub.2 is a carboxy group, an alkoxycarbonyl group or a sulfo group.

REFERENCES:
patent: Re28258 (1974-12-01), Gilman et al.
patent: 3501310 (1970-03-01), Illingsworth et al.
patent: 3505070 (1970-04-01), Litzerman et al.
patent: 3510348 (1970-05-01), Brooks et al.
patent: 3816121 (1974-06-01), Shiba et al.
patent: 4059450 (1977-11-01), Vanassche et al.
patent: 4814263 (1989-03-01), Hine
patent: 4891307 (1990-01-01), Mukunoki et al.

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