Direct positive light-sensitive silver halide photographic mater

Details Direct positive light-sensitive silver halide photographic mater Direct positive light-sensitive silver halide photographic mater

1989-10-10

1991-02-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Silver compound sensitizer containing

430598, 430611, 430613, 430614, 430621, 430622, 430623, 430626, G03C 102

Patent

active

049904388

ABSTRACT:
Disclosed is a direct positive light-sensitive photographic material having at least one silver halide emulsion layer containing inner latent image type silver halide grains not previously fogged, which gives a direct positive image after image exposure by surface development after application of fogging treatment or while applying fogging treatment, wherein the inner latent image type silver halide grains comprise substantially silver chloride, and the silver halide emulsion layer or a hydrophilic colloid layer adjacent thereto contains at least one active halide type or active vinyl type gelatin hardener, and at least one compound represented by the formula (I) or (II) described in the specification. This direct positive light-sensitive silver halide photographic material is particularly excellent in stability with lapse of time.

REFERENCES:
patent: 4495274 (1985-01-01), Yoshida
patent: 4607004 (1986-08-01), Ikenoue et al.
patent: 4837143 (1989-06-01), Komorita et al.
patent: 4868102 (1989-09-01), Ogi et al.
patent: 4871658 (1989-10-01), Sakamoto et al.

Affiliated with

Also associated with

Rating

Direct positive light-sensitive silver halide photographic mater does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Direct positive light-sensitive silver halide photographic mater, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Direct positive light-sensitive silver halide photographic mater will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-10082