Direct phase shift measurement between interference patterns usi

Details Direct phase shift measurement between interference patterns usi Direct phase shift measurement between interference patterns usi

1998-04-07

2000-09-19

Turner, Samuel A.

Optics: measuring and testing

By particle light scattering

With photocell detection

356354, G01B 902

Patent

active

061220566

ABSTRACT:
A method of measuring the phase shift between two regions of a phase shift mask. A workpiece is provided including a first pair of slits each having a substantially similar phase shift characteristic and a second pair of slits each having a different phase shift characteristic. Electromagnetic radiation is directed through the first pair of slits and the second pair of slits on the workpiece. A relative shift is measured between interference patterns caused by the first pair of slits and the second pair of slits.

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