Optical waveguides – Integrated optical circuit
Reexamination Certificate
2005-08-02
2005-08-02
Healy, Brian M. (Department: 2883)
Optical waveguides
Integrated optical circuit
C385S129000, C385S130000, C385S131000, C385S141000, C438S029000, C438S031000
Reexamination Certificate
active
06925216
ABSTRACT:
An optical waveguide structure is formed by embedding a core material within a medium of lower refractive index, i.e. the cladding. The optical index of refraction of amorphous silicon (a-Si) and polycrystalline silicon (p-Si), in the wavelength range between about 1.2 and about 1.6 micrometers, differ by up to about 20%, with the amorphous phase having the larger index. Spatially selective laser crystallization of amorphous silicon provides a mechanism for controlling the spatial variation of the refractive index and for surrounding the amorphous regions with crystalline material. In cases where an amorphous silicon film is interposed between layers of low refractive index, for example, a structure comprised of a SiO2substrate, a Si film and an SiO2film, the formation of guided wave structures is particularly simple.
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Bond Steven W.
Bond Tiziana C.
Hau-Riege Stefan
Pocha Michael D.
Vernon Steve
Healy Brian M.
Scott Eddie E.
Tak James S.
The Regents of the University of California
Thompson Alan H.
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