Direct negative and offset master production using thermal lifto

Printing – Planographic – Lithographic printing plates

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

1014631, 1014011, 400120, 4002411, 346 76PH, 428195, 428484, 428212, 4284881, 4284884, 428913, 428914, B41N 108, B41C 110

Patent

active

048361054

ABSTRACT:
An improved printing member for use in a system wherein a current source, in combination with a resistive ribbon, produces heating in selected areas of the ribbon for effecting the formation of a printing pattern on the printing member, which member is composed of a first layer, having a predetermined melting temperature, and a heat-conducting layer which adheres to the first layer below its predetermined melting temperature and which adheres to said resistive ribbon at temperatures above said predetermined melting temperature, such that, when the second layer is heated to a temperature level above the predetermined melting temperature in selected areas forming a pattern to be printed, the selected areas will adhere to the resistive ribbon and release from the first layer. Consequently, when the resistive ribbon is in contact with the heat-conductive layer while at a temperature level above the predetermined melting temperature of the first layer and is then drawn away from the heat-conductive layer, the selected areas will be removed from the heat-conductive layer forming the pattern to be printed therein.

REFERENCES:
patent: 3060023 (1962-10-01), Burg
patent: 3267848 (1966-08-01), Bach
patent: 3342623 (1967-09-01), Dulmage
patent: 3483027 (1969-12-01), Ritzerfeld
patent: 3559576 (1971-02-01), Vrancken
patent: 4123309 (1978-10-01), Perrington et al.
patent: 4157412 (1979-06-01), Deneau
patent: 4374691 (1983-02-01), Vanden Bergh
patent: 4400100 (1983-08-01), Aviram
patent: 4453839 (1984-06-01), Findlay
patent: 4525722 (1985-06-01), Sachdev
patent: 4651162 (1987-03-01), Nakamura
patent: 4672393 (1987-06-01), Uchikata
patent: 4707211 (1987-11-01), Shibata
patent: 4724445 (1988-02-01), Amano
IBM; IBM Tech. Disc.; vol. 30, No. 3, Aug. 1987; p. 1109.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Direct negative and offset master production using thermal lifto does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Direct negative and offset master production using thermal lifto, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Direct negative and offset master production using thermal lifto will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-32303

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.