Direct-heated flow measuring apparatus having improved sensitivi

Measuring and testing – Volume or rate of flow – Thermal type

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G01F 168

Patent

active

048438820

ABSTRACT:
In a direct-heated flow measuring apparatus including a film resistor having a substrate supported by a supporting member in a passage, at least one face of the substrate on the upstream side thereof is sloped with respect to a fluid stream within the passage.

REFERENCES:
patent: 3975951 (1976-08-01), Kohama et al.
patent: 4279146 (1981-07-01), Wessel et al.
patent: 4294114 (1981-10-01), Lauterbach
patent: 4304130 (1981-12-01), Peter et al.
patent: 4448070 (1984-05-01), Ohyama et al.
patent: 4542650 (1985-09-01), Renken et al.
patent: 4548078 (1985-10-01), Bohrer et al.
patent: 4624138 (1986-11-01), Ono
patent: 4677850 (1987-07-01), Miura et al.
patent: 4682496 (1987-07-01), Miura et al.
patent: 4693115 (1987-09-01), Tokura et al.
patent: 4705713 (1987-11-01), Ohta et al.

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