Direct electroless deposition of cuprous oxide films

Details Direct electroless deposition of cuprous oxide films Direct electroless deposition of cuprous oxide films

1981-02-27

1983-08-23

Lawrence, Evan K.

Stock material or miscellaneous articles

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Of quartz or glass

427301, 427305, 428702, 428936, B32B 1706, C03C 1736

Patent

active

044004362

ABSTRACT:
Cuprous oxide films are directly deposited by chemical reduction from an aqueous solution of a copper salt, a complexing agent and a reducing agent maintained at a critical pH of at least about 12.9.

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