Direct electroless deposition of cuprous oxide films

Details Direct electroless deposition of cuprous oxide films Direct electroless deposition of cuprous oxide films

1980-06-30

1982-02-09

Lawrence, Evan K.

Stock material or miscellaneous articles

Composite

Of quartz or glass

427304, 427305, 428702, 428936, B32B 1706, C03C 1736

Patent

active

043150551

ABSTRACT:
Cuprous oxide films are directly deposited by chemical reduction from an aqueous solution of a copper salt, a complexing agent and a reducing agent maintained at a pH of at least about 12.9.

REFERENCES:
patent: 2532283 (1950-12-01), Brenner et al.
patent: 2532284 (1950-12-01), Brenner et al.
patent: 2956900 (1960-10-01), Carlson et al.
patent: 3377174 (1968-04-01), Torigai et al.
patent: 3457138 (1969-07-01), Miller
patent: 3671291 (1972-06-01), Miller et al.
patent: 3846152 (1974-11-01), Franz
patent: 3920864 (1975-11-01), Greenberg et al.
patent: 3944440 (1976-03-01), Franz
patent: 3978272 (1976-08-01), Donley
patent: 4170461 (1979-10-01), Breininger et al.

Affiliated with

Also associated with

Rating

Direct electroless deposition of cuprous oxide films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Direct electroless deposition of cuprous oxide films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Direct electroless deposition of cuprous oxide films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1260957