Dipole ring magnet for use in magnetron sputtering or magnetron

Details Dipole ring magnet for use in magnetron sputtering or magnetron Dipole ring magnet for use in magnetron sputtering or magnetron

1994-12-28

1996-05-21

Picard, Leo P.

Electricity: magnetically operated switches, magnets, and electr

Magnets and electromagnets

Magnet structure or material

H01F 702

Patent

active

055193730

ABSTRACT:
The invention relates to a dipole ring magnet for use in magnetron sputtering apparatus or magnetron etching apparatus to produce a uniform magnetic field. Essentially the dipole ring magnet is an assembly of a plurality of pillar-like, anisotropic magnet segments in a circumferential arrangement. Each of the pillar-like magnet segments is magnetized in a direction normal to its longitudinal axis, and in assembling the ring magnet the magnet segments are differently oriented such that a magnetic field in the direction of a diameter of the ring is produced inside the ring magnet. To improve the uniformity of the magnetic field, particularly in respect of a component normal to the longitudinal axis of the ring magnet, each pillar-like segment is devoid of a lengthwise middle part to provide a vacant space in place of the middle part, and the length of the vacant space is regulated according to the position of the segment in the ring magnet.

REFERENCES:
patent: H693 (1989-10-01), Leupold
patent: 4538130 (1985-08-01), Gluckstern et al.
patent: 4612505 (1986-09-01), Zijlstra
patent: 4646046 (1987-02-01), Vavrek et al.
patent: 4758813 (1988-07-01), Holsinger et al.
patent: 4849727 (1989-07-01), Sasaki et al.
patent: 4862128 (1989-08-01), Leupold
patent: 5148138 (1992-09-01), Miyata

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