Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Group iiia metal or beryllium
Patent
1988-09-30
1989-08-08
Stoll, Robert L.
Chemistry of inorganic compounds
Treating mixture to obtain metal containing compound
Group iiia metal or beryllium
423126, 423131, 423624, 423DIG14, 75101BE, C01G 1500
Patent
active
048551147
ABSTRACT:
Disclosed is a process for recovering gallium values contained in a basic aqueous solution by liquid/liquid extraction thereof. The liquid/liquid extraction process comprises contacting the basic aqueous solution with a water-immiscible, organic phase comprising a substituted hydroxyquinoline dissolved in an organic solvent therefor whereby gallium is extracted into the organic phase. Thereafter, the organic phase is separated from the basic aqueous phase and the gallium recovered from the separated organic phase. The improvement in process of the present invention comprises the organic phase further comprising dissolved therein an organic dioxime compound.
REFERENCES:
patent: 3971843 (1976-07-01), Helgorsky et al.
patent: 4051230 (1977-09-01), Miyauchi
patent: 4169130 (1979-09-01), Helgorsky et al.
patent: 4241029 (1980-12-01), Helgorsky et al.
patent: 4468374 (1984-08-01), Kataoka et al.
patent: 4485076 (1984-11-01), Bauer et al.
patent: 4559203 (1985-12-01), Bauer et al.
patent: 4587106 (1986-05-01), Bauer et al.
patent: 4666686 (1987-05-01), Krajewski et al.
patent: 4741887 (1988-05-01), Coleman et al.
patent: 4759917 (1988-07-01), Coleman et al.
Harvey Paige C.
Sherex Chemical Company Inc.
Stoll Robert L.
LandOfFree
Dioxime kinetic enhancer for solvent extraction of gallium from does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Dioxime kinetic enhancer for solvent extraction of gallium from , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dioxime kinetic enhancer for solvent extraction of gallium from will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-904392