Diode-connected semiconductor device and method of manufacture

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437 40, 437 41, 437904, H01L 2104, H01L 21265

Patent

active

057143935

ABSTRACT:
A compact diode-connected semiconductor device (20) and a method of manufacturing the field effect transistor (10). A doped layer (44) is formed in a semiconductor substrate (41) which serves as a drain extension region. An oxide layer (46) is formed on the semiconductor substrate (41) and an opening (50) is formed in the oxide layer (46). A gate structure (81) having an active gate portion (78) and a gate shorting structure (22) are formed on the oxide layer (46). The gate shorting structure (22) and the portion of the semiconductor substrate (41) adjacent the active gate portion (78) are doped with an impurity material of the same conductivity type as the doped layer (44). The gate shorting structure (22) serves as a source of impurity material for the drain region.

REFERENCES:
patent: 5053849 (1991-10-01), Izawa et al.
patent: 5267194 (1993-11-01), Jang
patent: 5302536 (1994-04-01), Josquin
patent: 5358879 (1994-10-01), Brady et al.
"Field Effect-Transistor With Asymmetrical Structure", Codella et al., United States Statutory Invention Registration No. H986, Published Nov. 5, 1991, U.S. Class 437, Subclass 41, Application Filing Date Jun. 9, 1989.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Diode-connected semiconductor device and method of manufacture does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Diode-connected semiconductor device and method of manufacture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Diode-connected semiconductor device and method of manufacture will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-661768

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.