Optics: measuring and testing – By monitoring of webs or thread – For flaws or imperfections
Reexamination Certificate
2007-11-27
2007-11-27
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
By monitoring of webs or thread
For flaws or imperfections
C356S243100
Reexamination Certificate
active
10770151
ABSTRACT:
A calibration standard, for calibrating lateral or angular dimensional measurement systems, is provided. The standard may include a first substrate spaced from a second substrate. The standard may be cross-sectioned in a direction substantially perpendicular or substantially non-perpendicular to an upper surface of the first substrate. The cross-sectioned portion of the standard may form a viewing surface of the calibration standard. The standard may include at least one layer disposed between the first and second substrates. The layer, or a feature etched into the first or second substrate or a feature etched into the layer may have a traceably measured thickness or may be oriented at a traceably measured angle with respect to the viewing surface. A thickness or angle of the layer or other feature may be traceably measured using any technique for calibrating a measurement system with a standard reference material traceable to a national testing authority.
REFERENCES:
patent: 5246539 (1993-09-01), Canestrari et al.
patent: 5534359 (1996-07-01), Bartha et al.
patent: 5665905 (1997-09-01), Bartha et al.
patent: 5684301 (1997-11-01), Cresswell et al.
patent: 5914784 (1999-06-01), Ausschnitt et al.
patent: 5920067 (1999-07-01), Cresswell et al.
patent: 5955654 (1999-09-01), Stover et al.
patent: 5960255 (1999-09-01), Bartha et al.
patent: 5969273 (1999-10-01), Archie et al.
patent: 6016684 (2000-01-01), Scheer et al.
patent: 6128089 (2000-10-01), Auschnitt et al.
patent: 6646737 (2003-11-01), Tortonese et al.
patent: 2003/0058437 (2003-03-01), Tortonese et al.
US 5,841,144, 11/1998, Cresswell (withdrawn)
Allen et al., “Sheet and Line Resistance of Patterned SOI Surface Film CD Reference Materials as a Function of Substrate Bias,” 1999, inProceedings if the IEEE 1999 Conference one Microelectronic Test Structuers.vol. 12, Mar. 1999. pp. 51-55.
Allen et al., “Evaluation of Surface Depletion Effects in Single-Crystal Test Structures for Reference Materials Applications,” inCharacterization and Metrology for ULSI Technology: 1998 International Conference.1998, pp. 357-362., American Institute of Physics, College Park, MD.
Allen et al., “Comparison of Properties of Electrical Test Structures Patterned in BESOI and SMOX Films for CD Reference-Material Applications,” SPIE vol. 3332, 1998, pp. 124-131.
UCSB College of Engineering Press Release : “Researchers Discover How to Make the Smallest, Most Perfect, Densest nanowire Lattices—And It's a SNAP”, Mar. 13, 2003, http://www.engineering.ucsb.edu/Announce
anowire.html/.
Cresswell et al. “Electrical Linewidth Test Structures Fabricated in Monocrystalline Films for Reference-Material Applicaitons”, 1998, pp. 182-193.
MAG★I★CAL® DELUXE, A Magnicication Calibration Sample for Transmission Electron Microscpes, from http://www.emdiasum.com/ems/calibration/magical.html, Nov. 14, 2003.
Blanquies René M.
Brady Pat
Laird Ellen
Prochazka Jerry
Tortonese Marco
Isenberg Joshua D.
JDI Patent
KLA Tencor, Inc.
Toatley , Jr. Gregory J.
Ton Tri
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