Data processing: measuring – calibrating – or testing – Measurement system – Orientation or position
Reexamination Certificate
2009-12-10
2011-12-06
Khuu, Cindy Hien-Dieu (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system
Orientation or position
Reexamination Certificate
active
08073650
ABSTRACT:
An exemplar dimension measuring apparatus includes a objective, a stage for fixing a workpiece, a projecting member located between the objective and the stage, a light source under the stage, configured for illuminating the workpiece such that a projection of the workpiece is formed on the projection member, an eyepiece coupled with the objective, and a processing unit. The eyepiece has a reticle, configured for viewing opposite extremities of the projection and facilitating alignment of the reticle with each of the extremities of the projection. The processing unit is configured for storing X-coordinates of the extremities of the projection on a Cartesian coordinate system, and calculating a difference between X-coordinates of the opposite extremities of the projection.
REFERENCES:
patent: 3861808 (1975-01-01), Halsey
patent: 5024512 (1991-06-01), Greene et al.
patent: 6320658 (2001-11-01), Mizutani
patent: 6358749 (2002-03-01), Orthman
patent: 2006/0139642 (2006-06-01), Van Bilsen
patent: 2009/0073392 (2009-03-01), Mann et al.
Altis Law Group, Inc.
Hon Hai Precision Industry Co. Ltd.
Khuu Cindy Hien-Dieu
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