Difluoromethoxy-2, 2, 2-trifluoroethane compositions and methods

Details Difluoromethoxy-2, 2, 2-trifluoroethane compositions and methods Difluoromethoxy-2, 2, 2-trifluoroethane compositions and methods

1997-04-29

1999-03-30

Dote, Janis L.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Post imaging process, finishing, or perfecting composition...

430 97, 427335, G03G 1320

Patent

active

058886885

ABSTRACT:
The present invention relates to new uses of difluoromethoxy-2,2,2-trifluoroethane (E245) or of compositions which contain difluoromethoxy-2,2,2-trifluoroethane together with a further solvent (cosolvent). The invention furthermore relates to new compositions of E245 as a mixture with some of these solvents. A preferred process of use is fixing toner applied to a recording material in the fixing device of a printing or copying apparatus by means of a fixing vapor composed of difluoromethoxy-2,2,2-trifluoroethane (E245) alone or in admixture with a cosolvent.

REFERENCES:
patent: 3761524 (1973-09-01), Terrell et al.
patent: 3846332 (1974-11-01), Croix
patent: 3950168 (1976-04-01), Erhardt et al.
patent: 4311723 (1982-01-01), Mugrauer
patent: 5120462 (1992-06-01), Buchwald
patent: 5304320 (1994-04-01), Barthelemy et al.
patent: 5399281 (1995-03-01), Buchwald et al.
patent: 5413730 (1995-05-01), Barthelemy et al.
patent: 5529618 (1996-06-01), Buchwald et al.
Chemical Abstracts, vol. 97, No. 12 (Sep. 20, 1982), Columbus , Ohio abstract No. 101693m.

Affiliated with

Also associated with

Rating

Difluoromethoxy-2, 2, 2-trifluoroethane compositions and methods does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Difluoromethoxy-2, 2, 2-trifluoroethane compositions and methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Difluoromethoxy-2, 2, 2-trifluoroethane compositions and methods will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1213122