Diffusion reflector and manufacture of the same

Details Diffusion reflector and manufacture of the same Diffusion reflector and manufacture of the same

2001-09-20

2009-10-13

Nelms, David (Department: 2871)

Liquid crystal cells, elements and systems

Particular structure

Having significant detail of cell structure only

C349S187000

Reexamination Certificate

active

07602461

ABSTRACT:
There is provided a method of manufacturing a diffusing reflector which assures high diffusion efficiency and excellent reflection characteristic for the lighting.First, a resin film having photosensitivity is formed on a substrate2. Next, gathering of pillar-shaped bodies isolated each other by the patterning of resin film with the photolithography is provided. Subsequently, the uneven surface layer having the maximum inclination angle under 12° is formed by gently deforming individual pillar-shaped bodies with the heat treatment. Moreover, the gently deformed uneven surface layer is coated with the resin and the flat openings between pillar-shaped bodies arranged discretely are buried to ease the inclination angle. Finally, a metal film13formed on the gently deformed uneven surface layer.

REFERENCES:
patent: 5847789 (1998-12-01), Nakamura et al.
patent: 5936688 (1999-08-01), Tsuda et al.
patent: 6094252 (2000-07-01), Itoh et al.
patent: 0 084 930 (1986-04-01), None
patent: 04-243226 (1992-08-01), None
patent: 06-167708 (1994-06-01), None
patent: 08-166605 (1996-06-01), None
patent: 10-153779 (1998-06-01), None
Japanese Office Action dated May 30, 2008 for Application No. 10-189654.
Office Action for Japanese Application No. 10-189654 filed May 11, 2007.

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