Diffusion plasma-assisted chemical treatment apparatus

Details Diffusion plasma-assisted chemical treatment apparatus Diffusion plasma-assisted chemical treatment apparatus

1990-10-15

1992-04-21

Simmons, David A.

Coating apparatus

Gas or vapor deposition

With treating means

118733, 118719, 156345, H01L 2100

Patent

active

051057611

ABSTRACT:
The apparatus comprises a tight treatment enclosure (10), means (20,22) for the axial production of a carrier gas plasma, a solid plate (30) serving as an obstacle to the plasma and located perpendicular to the enclosure axis and downstream of the plasma production means, plasma diffusion means (40) located downstream of the obstacle plate, several non-ionized vector gas supply tubes (50) issuing axially into the enclosure beneath the diffusion means and all located in the same plane around the enclosure axis, a substrate carrier (56) positioned downstream of the vector gas supply tubes and perpendicular to the axis and annular pumping means (66,16) for the gaseous medium contained in the enclosure and positioned downstream of the substrate carrier.

REFERENCES:
patent: 4401054 (1983-08-01), Matsuo et al.
patent: 4659449 (1987-04-01), Watanabe
patent: 4944244 (1990-07-01), Moisan et al.
patent: 4998503 (1991-03-01), Murakami et al.
Microelectronic Engineering 3 (1985) 397-410.

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