Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent
1977-01-06
1978-05-16
Ozaki, G.
Metal treatment
Process of modifying or maintaining internal physical...
Chemical-heat removing or burning of metal
148186, 148187, 148188, H01L 21208
Patent
active
040897133
ABSTRACT:
A method of adjusting donor concentration in a body of mercury cadmium telluride comprising the steps of contacting the mercury cadmium telluride with a quantity of donor material selected from the group consisting of gallium and gallium alloys containing up to 3% of aluminum, tin or cadmium and heating the body at a temperature of at least 200.degree. C for a sufficient time to diffuse the donor material within the body. The donor material is placed in contact with the body of mercury cadmium telluride by immersing the body in a molten quantity of the donor material to wet the surface thereof. Further included is the step of removing any undistributed donor material after heating. Also disclosed is a method of adjusting the donor concentration in the first region of mercury cadmium telluride with respect to a second adjacent region by practicing the process of this invention on the first region only. Since donor materials tend to increase the N-type concentration, a PN junction can be formed from P-type material and an N N+ junction may be formed from N-type material.
REFERENCES:
patent: 3692594 (1972-09-01), Cannuli
patent: 3745073 (1973-07-01), Kun et al.
patent: 3949223 (1976-04-01), Schmit et al.
patent: 4003759 (1977-01-01), Koehler
Honeywell Inc.
Munday John S.
Ozaki G.
LandOfFree
Diffusion of donors into (Hg Cd) Te through use of Ga-Al alloy does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Diffusion of donors into (Hg Cd) Te through use of Ga-Al alloy, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Diffusion of donors into (Hg Cd) Te through use of Ga-Al alloy will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1196079