Diffusion equipment

Details Diffusion equipment Diffusion equipment

1982-12-03

1985-01-15

Smith, John D.

Coating apparatus

Gas or vapor deposition

Multizone chamber

118726, 118733, 118900, C23C 1308

Patent

active

044932871

ABSTRACT:
To secure accurate control over rapid diffusion such as the diffusion of zinc into gallium arsenide, the source and slices to be processed are isolated from one another during an initial warm-up period. This is done using one vessel for the crystal slice and a second vessel for the source. The source vessel initially blocks an opening in the slice vessel while the source and slice are brought to the desired diffusion temperature. The source vessel is then slid through the opening to a diffusing position in which a trailing part of the source vessel again plugs the opening in the slice vessel and in which an open part of the source vessel is now in the interior of the slice vessel. Use of this arrangement avoids the uncontrolled diffusion which occurs in current diffusion capsules during initial heating of the capsule.

REFERENCES:
patent: 3441000 (1969-04-01), Burd et al.
patent: 4067697 (1978-01-01), Polaschegg
patent: 4312294 (1982-01-01), Satoh
Silvestri, "App. for the Introduction of Substrates into a Vapor Deposition System", IBM Tech. Disclosure Bulletin, vol. 8, No. 5, Oct. 1965, pp. 708-709.

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