Diffusion apparatus

Details Diffusion apparatus Diffusion apparatus

1978-05-05

1980-07-08

Louie, Jr., Won H.

Coating apparatus

Gas or vapor deposition

With treating means

156611, C23C 1308

Patent

active

042111820

ABSTRACT:
A diffusion apparatus, particularly useful for diffusing aluminum into semiconductor wafers, comprises a quartz evaporation tube in combination with a restrictor plate which is inserted in an open end thereof. The restrictor plate preferably has substantially the same shape as, but a slightly smaller cross-section than, the evaporation tube. In practice, the relatively small gap between the restrictor plate and the evaporation tube results in a substantially negligible leak in the diffusion apparatus. As a result the apparatus effectively operates as if it were a sealed ampule while in fact it is open, i.e. not sealed.

REFERENCES:
patent: 2341603 (1944-02-01), Dorn et al.
patent: 3350885 (1967-11-01), Hall et al.
patent: 3568632 (1971-03-01), Cawthon
patent: 3577287 (1971-05-01), Norwich et al.
patent: 3578495 (1971-05-01), Pammer et al.

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