Chemistry: electrical and wave energy – Apparatus – Electrolytic
Reexamination Certificate
2005-04-19
2005-04-19
Mayekar, Kishor (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Electrolytic
C204S242000, C204S275100, C204S286100, C204S297010, C204SDIG007
Reexamination Certificate
active
06881309
ABSTRACT:
In an electroplating reactor for plating a spinning wafer, a diffusion plate is supported above an anode located within a cup filled with process fluid within the reactor. The diffusion plate includes a plurality of openings which are arranged in a spiral pattern. The openings allow for an improved plating thickness distribution on the wafer surface. The openings can be elongated slots curved along the direction of the spiral path.
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Hanson Kyle M.
Simchuk Jerry
Thompson Raymon F.
Weaver Robert A.
Mayekar Kishor
Perkins Coie LLP
Semitool Inc.
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