Gas and liquid contact apparatus – Contact devices – Liquid tank
Patent
1995-03-27
1996-10-01
Miles, Tim R.
Gas and liquid contact apparatus
Contact devices
Liquid tank
501 80, B01F 304
Patent
active
055608744
ABSTRACT:
A rigid, monolithic, porous gas diffusion element which is formed of a body of solid particles and which is comprised of a partially coated, permeable ceramic substrate is disclosed. The substrate consists essentially of a porous first ceramic material, has an apparent porosity of from about 35 to about 50 percent, and has a minimum active pore size of from about 40 to about 120 microns; and it is partially coated with a coating which consists essentially of a second ceramic material has an apparent porosity of from about 35 to about 55 percent, and has a minimum active pore size of from about 10 to about 40 microns. The minimum active pore size of the substrate is from about 2 to about 5 times as great as the minimum active pore size of the coating.
REFERENCES:
patent: 3507253 (1970-04-01), Willinger
patent: 3689611 (1972-09-01), Hardy et al.
patent: 3753746 (1973-08-01), Koerner
patent: 4046845 (1977-09-01), Veeder
patent: 4118450 (1978-10-01), Nakamura et al.
patent: 4184885 (1980-01-01), Pasco et al.
patent: 4261932 (1981-04-01), Ewing et al.
patent: 4261933 (1981-04-01), Ewing et al.
patent: 4288935 (1981-09-01), Cross
patent: 4746341 (1988-05-01), Komoda
patent: 4820412 (1989-04-01), Rudolphi et al.
patent: 4965230 (1990-10-01), Nakajima et al.
patent: 5075048 (1991-12-01), Veeder
patent: 5262096 (1993-11-01), Egashira
patent: 5344799 (1994-09-01), Wu
patent: 5422043 (1995-06-01), Burris
Sheckler Chad A.
Stanton Harry C.
Greenwald Howard J.
Miles Tim R.
Refractron Technologies Corporation
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