Diffractive optical element

Details Diffractive optical element Diffractive optical element

2002-01-22

2004-08-10

Dunn, Drew A. (Department: 2872)

Optical: systems and elements

Diffraction

From grating

C359S569000, C359S566000

Reexamination Certificate

active

06775066

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to an improved diffraction optical element (DOE). In particular, it relates to the DOE having a smoothly etched surface substrate.
2. Description of the Prior Art
With the miniaturization of electronic components and electronic devices used in mobile telephones, personal computers, etc., there has been increasing demand for finer and higher speed drill processing. The application of a DOE has been promoted as a key device to satisfy this demand.
Unlike conventional optical components utilizing refraction and/or reflection, the DOE utilizes optical diffraction and directly controls the optical phases, and therefore, a wide range of applications including, multi-spot beam splitters, for example, can be expected.
As shown in
FIG. 5
, the DOE can split one processing laser beam into multiple spots. Simultaneous processing at plural spots, shaping patterns such as marking, and non-circular-shape processing have been achieved with high-speed.
FIG. 4
shows an example wherein the DOE is utilized in drill processing using a carbon dioxide gas laser to split one processing laser beam into multiple spots and simultaneously drill a plurality of holes. (Japanese Patent Laid-Open No. 2000-280226 and Japanese Patent Laid-Open No.2000-280225).
SUMMARY OF THE INVENTION
The present invention provides an improved DOE which has a smoothly etched surface.
The DOE of the present invention comprises a polycrystalline substrate which has an upper film layer having the same material as the substrate, and having finer polycrystalline grains than that of the substrate or having an amorphous phase laminated on the substrate.
It is preferable that the DOE be provided with a polycrystalline substrate whose diameter of crystal grains at an etched surface is not more than 1 &mgr;m.
It is also preferable that the DOE be provided with an amorphous phase at an etched surface of the substrate.


REFERENCES:
patent: 0 629 592 (1994-12-01), None
patent: 10-300912 (1998-11-01), None
patent: 2000-280225 (2000-10-01), None
patent: 2000-280226 (2000-10-01), None
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K. Fuse, K. Ebata, T. Okada, K. Kurisu, and M. Shiozaki, “Optical Properties of ZnSe Diffractive Optical Elements for Spot Array Generation,”Proceedings of the SPIE,vol. 3888, 2000, p. 497-508.
K. Kawamura, N. Sarukura, M. Hirano, and H. Hosono, “Holographic Encoding of Permanent Gratings Embedded in Diamond by Two Beam Interference of a Single Femtosecond Near-Infrared Laser Pulse,”Japanese Journal of Applied Physics,vol. 39, No. 8A, Aug. 1, 2000, pp. L767-L769.
T. Ishihara, G. Brunthaler, W. Walecki, M. Hagerott, A. Nurmikko, N. Samarth, H. Luo, & J. Furdyna, “Distributed Feedback Operation of Optically Pumped ZnSe Quantum-well Lasers in the Blue-Green,”Applied Physics Letters,vol. 60, No. 20, May 18, 1992, pp. 2460-2462.
J. Teteris & O. Nordman, “Relaxation Process of Holographic Gratings in Amorphous As2S3Films,”Journal of the Optical Society of America,vol. 14, No. 10, Oct. 1997, pp. 2498-2504.

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