Diffractive element in extreme-UV lithography condenser

Details Diffractive element in extreme-UV lithography condenser Diffractive element in extreme-UV lithography condenser

1998-08-06

2000-09-12

Spyrou, Cassandra

Optical: systems and elements

Having significant infrared or ultraviolet property

Having folded optical path

359570, 359572, 359857, 359858, 359859, 359350, 378 34, 355 67, G02B 508, G02B 518, G02B 510, G21K 500, G03B 2754

Patent

active

061185779

ABSTRACT:
Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

REFERENCES:
patent: 4798446 (1989-01-01), Hettrick
patent: 4915463 (1990-04-01), Barbee, Jr.
patent: 5138490 (1992-08-01), Hohberg et al.
patent: 5339346 (1994-08-01), White
patent: 5361292 (1994-11-01), Sweatt
patent: 5439781 (1995-08-01), MacDowell et al.
patent: 5512759 (1996-04-01), Sweatt
patent: 5631721 (1997-05-01), Stanton et al.
patent: 5815249 (1998-09-01), Nishi et al.
patent: 5848119 (1998-12-01), Miyake et al.
patent: 6002520 (1999-12-01), Hoch et al.
Schmiedeskamp, B. et al., "Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings", Optical Engineering, 33 (4) 1314-1321, 1994. (Apr.).
Patent Abstract of Japan, Publication No. 61141135, Jun. 28, 1986.
Patent Abstract of Japan, Publication No. 59155920, Sep. 5, 1984.

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