Diffraction pupil filler modified illuminator for annular pupil

Details Diffraction pupil filler modified illuminator for annular pupil Diffraction pupil filler modified illuminator for annular pupil

1995-05-24

1997-09-02

Grimley, Arthur T.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 52, 355 55, G03B 2772, G03B 2768, G03B 2752

Patent

active

056637853

ABSTRACT:
Uniform illumination of a photomask in optical lithography is achieved with annular illumination of the conjugate pupil plane in a lithography tool. A spinning diffraction filter is placed in a stepper so as to provide annular illumination on a time averaged basis. This approach provides annular illumination for resolution enhancement in an easily manufacturable and flexible way and without significant loss of light intensity. No illuminator redesign in the photolithographic exposure tool is required.

REFERENCES:
patent: 4933714 (1990-06-01), Buckley et al.
patent: 5418598 (1995-05-01), Fukuda et al.
patent: 5440426 (1995-08-01), Sandstrom

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