Diffraction pattern amplitude analysis for use in fabric inspect

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250572, 250578, 356200, G01N 2132

Patent

active

040938662

ABSTRACT:
A technique is provided for analyzing the shape of the amplitude envelope of a diffraction pattern's first order side lobe resulting from passing coherent light through a fabric material. The light intensity of the lobe is scanned from one side of the lobe to the other by a linear photo-diode array to provide successive voltage signals whose respective voltage values are a function of the light intensity at successively spaced increments from one side of the lobe to the other. Each of these successive voltage signals are compared with a series of reference voltages of substantially less number than the number of spaced increments, each reference voltage having a value greater than the value of the preceding reference voltage in the series to define a voltage range encompassing the highest voltage in the series of voltage signals. A numerical count is then provided of those voltage signals which have voltage values falling between the values of adjacent reference voltages in the series of reference voltages so that a plurality of counts is provided which indicates the amplitude distribution of light in the light lobe. The plurality of counts is substantially less in number than the number of spaced increments thereby reducing storage data requirements in the analysis of the amplitude envelope of the light lobe. Successive first order side lobes developed by successively passing the light beam through different areas of the fabric to cover a large area are analyzed to provide a succession of the pluralities of counts.

REFERENCES:
patent: 3618063 (1971-11-01), Johnson
patent: 3908118 (1975-09-01), Micka
patent: 3980891 (1976-09-01), Slaker

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Diffraction pattern amplitude analysis for use in fabric inspect does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Diffraction pattern amplitude analysis for use in fabric inspect, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Diffraction pattern amplitude analysis for use in fabric inspect will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1494800

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.