Diffraction grating and manufacturing method thereof

Details Diffraction grating and manufacturing method thereof Diffraction grating and manufacturing method thereof

1988-12-17

1991-04-16

Arnold, Bruce Y.

35016223, 3501622, G02B 518

Patent

active

050077090

ABSTRACT:
A diffraction grating has a reflection film formed on a photosensitive layer disposed on a substrate through exposure followed by development and the groove profile thus formed has a configuration distorted from a sinusoidal form because the sensitivity curve of the photosensitive layer is of the second order non-linearity to the exposure amount. With the groove pitch expressed by d, K=2 .pi./d, the coordinate perpendicular to the groove direction taken as x, and the groove profile .eta.(x) expressed as .eta.(x)=h [sin (Kx)+.gamma.sin (2Kz-90.degree.)], the parameters h, .gamma. and .phi. satisfy as follows:

REFERENCES:
patent: 4148549 (1979-04-01), Termanis
patent: 4402571 (1983-09-01), Cowan et al.
Bliek et al, "Microwave Verification of a Numerical Optimization of Fourier Gratings", Appl. Phys. 24, pp. 147-150 (81).

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