Diffraction efficiency control in holographic elements

Radiation imagery chemistry: process – composition – or product th – Holographic process – composition – or product

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430 2, 430323, 359 9, 359 12, G03H 104

Patent

active

052780082

ABSTRACT:
A method for precisely controlling the overall average diffraction efficiency of a hologram including the steps of (a) providing a hologram layer that includes a hologram formed pursuant to hologram forming exposure and development, (b) coating the hologram layer with a photoresist layer, (c) masking the photoresist layer with a mask having opaque and transparent areas wherein the proportion of the opaque areas relative to the transparent areas is selected pursuant to the desired diffraction efficiency, the opaque and transparent areas being sufficiently small so as to have little noticeable effect when the resulting hologram is played back, (d) exposing the photoresist layer to actinic illumination through the mask transparent areas, (e) developing the photoresist layer to remove the photoresist in the areas illuminated by the actinic illumination to uncover the areas of the recording material corresponding to the transparent areas of the mask, (f) etching the recording material to remove the areas thereof that were uncovered by etching of the photoresist, and (g) removing the remaining photoresist. The formation of the hologram can be at an effective exposure in the saturated region of the efficiency vs. exposure curve wherein changes in efficiency as a function of parameter variation are small.

REFERENCES:
patent: 3892571 (1975-07-01), Simeonov et al.
patent: 3960560 (1976-06-01), Sato
patent: 4088490 (1978-05-01), Duke et al.
patent: 4677285 (1987-06-01), Taniguchi
patent: 4818045 (1989-04-01), Chang
patent: 4906552 (1990-03-01), Ngo et al.
patent: 4988151 (1991-01-01), Moss

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Diffraction efficiency control in holographic elements does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Diffraction efficiency control in holographic elements, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Diffraction efficiency control in holographic elements will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1630177

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.