Differential interferometer system and lithographic step-and-sca

Details Differential interferometer system and lithographic step-and-sca Differential interferometer system and lithographic step-and-sca

1997-03-06

2000-04-04

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Step and repeat

356351, G03B 2742, G01B 902

Patent

active

060467924

ABSTRACT:
A differential interferometer system for measuring the mutual positions and movements of a first object (WH) and a second object (MH). The system comprises a first interferometer unit (1, 2, 3, 4) having a first measuring reflector (RW) and a second interferometer unit (5, 6, 7, 8) having a second measuring reflector (RM). Since a measuring beam (b.sub.m) passes through both the first and the second interferometer unit and is reflected by both the first and the second measuring reflector, and since the measuring beam and the reference beam (b.sub.r) traverse the same path at least between the two interferometer units, accurate measurements can be preformed very rapidly. The interferometer system may be used to great advantage in a step-and-scan-lithographic projection apparatus.

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