Dielectric recording medium, and method of and apparatus for...

Stock material or miscellaneous articles – Circular sheet or circular blank – Edge structure

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C428S064400, C428S065100, C428S192000, C428S446000, C428S069000, C428S450000

Reexamination Certificate

active

06942914

ABSTRACT:
The dielectric material is, for example, a ferroelectric single crystal having a uniform thickness, and its one surface is used for a recording and reproducing surface on which a probe for recording and reproducing works. LiTaO3is used as the dielectric material. The conductive thin film, which is, for example, about 1000 to 2000 Å thick, is placed on a surrounding portion of a recording and reproducing surface, a back surface, and a side surface of the dielectric material. This conductive thin film, to which aluminum is added by a method of deposition, is connected to a common electrode of a recording and reproducing apparatus. The substrate is intended to preserve the dielectric material, which is thin, and it uses silicon or the like in a predetermined thickness, for example. A conductive paste is a material for sticking to the substrate the dielectric material having the conductive thin film thereon, and indium and silver paste are used for it.

REFERENCES:
patent: 5985404 (1999-11-01), Yano et al.
patent: 2003/0186090 (2003-10-01), Onoe et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dielectric recording medium, and method of and apparatus for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dielectric recording medium, and method of and apparatus for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dielectric recording medium, and method of and apparatus for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3380406

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.