Dielectric layer structure

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – Insulating material

Reexamination Certificate

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C257S635000, C257SE21576, C438S778000

Reexamination Certificate

active

07960826

ABSTRACT:
A dielectric layer structure includes an interlayer dielectric (ILD) layer covering at least a metal interconnect structure and a single tensile hydrophobic film. The ILD layer further includes a low-k dielectric layer, and the single tensile hydrophobic film is positioned on the low-k dielectric layer for counteracting at least a part of a stress of the low-k dielectric layer.

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