Dielectric isolated high voltage semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Including dielectric isolation means

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257504, 257506, 257547, H01L 2900

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active

059776064

ABSTRACT:
A dielectric isolated high voltage semiconductor device having an arrangement for extending a depletion layer of a main junction beyond an insulating layer containing an island to a semiconductor supporter by applying the same reverse biasing voltage to the supporter and the islands. That is, in the structure, an electrode is provided at the back surface of the supporter and connected to a main electrode of the selected island. The above-mentioned main junction is the pn junction to which the reverse biasing voltage for securing the withstand voltage of the semiconductor device is applied. The device is structured, also, with high impurity concentration regions for preventing a depletion layer, formed during a reverse biasing of the main junction of a circuit element of an island, from extending into adjacently disposed islands.

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patent: 4260431 (1981-04-01), Piotrowski
patent: 4287526 (1981-09-01), Sakuma
patent: 5040043 (1991-08-01), Ohno et al.
Patent Abstracts of Japan, vol. 6, No. 21 (E-93) (899), Feb. 6, 1982.
Patent Abstracts of Japan, vol. 7, No. 21 (E-155) (1166), Jan. 27, 1983.
Patent Abstracts of Japan, vol. 012, No. 320 (E-651), Aug. 30, 1988.
Patent Abstracts of Japan, vol. 009, No. 240 (E-345), Sep. 26, 1985.

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