Die-to-die photomask defect detection using region data to...

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

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C382S145000, C382S149000

Reexamination Certificate

active

07630535

ABSTRACT:
A pattern inspection apparatus which compares a plurality of partial optical image data of a same target plate to be inspected, the target plate being formed as a pattern, includes an optical image data acquiring unit which acquires optical image data of the target plate to be inspected, and a comparing circuit which compares the plurality of partial optical image data. In the comparing circuit, region image data generated based on information of region pattern representing a predetermined region is input, and a decision criterion is changed with reference to the input region image data when the plurality of partial optical image data are compared with each other to decide the presence/absence of a defect on the target plate.

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