Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-02-28
2009-12-08
Werner, Brian P (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S145000, C382S149000
Reexamination Certificate
active
07630535
ABSTRACT:
A pattern inspection apparatus which compares a plurality of partial optical image data of a same target plate to be inspected, the target plate being formed as a pattern, includes an optical image data acquiring unit which acquires optical image data of the target plate to be inspected, and a comparing circuit which compares the plurality of partial optical image data. In the comparing circuit, region image data generated based on information of region pattern representing a predetermined region is input, and a decision criterion is changed with reference to the input region image data when the plurality of partial optical image data are compared with each other to decide the presence/absence of a defect on the target plate.
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Advanced Mask Inspection Technology Inc.
Drennan Barry
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Werner Brian P
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