Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-11-22
2009-12-29
Werner, Brian P (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S145000, C382S149000
Reexamination Certificate
active
07639863
ABSTRACT:
A pattern inspection apparatus, including an optical image acquiring unit that acquires optical image data of a target plate to be inspected, the target plate being formed as a pattern. The pattern inspection apparatus also includes a design image data generating unit that generates design image data based on a design pattern serving as a base of pattern formation of the target plate. The pattern inspection apparatus further includes a comparing unit that inputs region image data generated based on information of a region pattern which is input to the pattern inspection apparatus. The information of the region pattern represents a predetermined region and is formed in the same format as that of information of the design pattern. The comparing unit compares the optical image data with the design image data based on the region image data.
REFERENCES:
patent: 5386221 (1995-01-01), Allen et al.
patent: 5404410 (1995-04-01), Tojo et al.
patent: 5563702 (1996-10-01), Emery et al.
patent: 5572598 (1996-11-01), Wihl et al.
patent: 6040911 (2000-03-01), Nozaki et al.
patent: 6069971 (2000-05-01), Kanno et al.
patent: 6484306 (2002-11-01), Bokor et al.
patent: 2002/0114506 (2002-08-01), Hiroi et al.
patent: 2003/0137665 (2003-07-01), Ando
patent: 2004/0105578 (2004-06-01), Tsuchiya et al.
patent: 2004/0148584 (2004-07-01), Tokunaga et al.
patent: 8-76359 (1996-03-01), None
patent: 11-073501 (1999-03-01), None
patent: 2002-237445 (2002-08-01), None
patent: 3413110 (2003-03-01), None
patent: 2003-215059 (2003-07-01), None
patent: 2004-101654 (2004-04-01), None
patent: 2004-191957 (2004-07-01), None
patent: 2004-317427 (2004-11-01), None
Tsuchiya, H., et al. (Apr. 1998) “A gray map reference pattern generator of a die-to-database mask inspection system for 256Mbit and 1Gbit DRAMs.” SPIE Conference on Photomask and X-Ray Mask Technology V. SPIE vol. 3412, pp. 544-551.
U.S. Appl. No. 11/276,426, filed Feb. 28, 2006, Isomura.
Advanced Mask Inspection Technology Inc.
Drennan Barry
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P
Werner Brian P
LandOfFree
Die-to-database photomask defect detection using region data... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Die-to-database photomask defect detection using region data..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Die-to-database photomask defect detection using region data... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4149215