Die-to-database photomask defect detection using region data...

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

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C382S145000, C382S149000

Reexamination Certificate

active

07639863

ABSTRACT:
A pattern inspection apparatus, including an optical image acquiring unit that acquires optical image data of a target plate to be inspected, the target plate being formed as a pattern. The pattern inspection apparatus also includes a design image data generating unit that generates design image data based on a design pattern serving as a base of pattern formation of the target plate. The pattern inspection apparatus further includes a comparing unit that inputs region image data generated based on information of a region pattern which is input to the pattern inspection apparatus. The information of the region pattern represents a predetermined region and is formed in the same format as that of information of the design pattern. The comparing unit compares the optical image data with the design image data based on the region image data.

REFERENCES:
patent: 5386221 (1995-01-01), Allen et al.
patent: 5404410 (1995-04-01), Tojo et al.
patent: 5563702 (1996-10-01), Emery et al.
patent: 5572598 (1996-11-01), Wihl et al.
patent: 6040911 (2000-03-01), Nozaki et al.
patent: 6069971 (2000-05-01), Kanno et al.
patent: 6484306 (2002-11-01), Bokor et al.
patent: 2002/0114506 (2002-08-01), Hiroi et al.
patent: 2003/0137665 (2003-07-01), Ando
patent: 2004/0105578 (2004-06-01), Tsuchiya et al.
patent: 2004/0148584 (2004-07-01), Tokunaga et al.
patent: 8-76359 (1996-03-01), None
patent: 11-073501 (1999-03-01), None
patent: 2002-237445 (2002-08-01), None
patent: 3413110 (2003-03-01), None
patent: 2003-215059 (2003-07-01), None
patent: 2004-101654 (2004-04-01), None
patent: 2004-191957 (2004-07-01), None
patent: 2004-317427 (2004-11-01), None
Tsuchiya, H., et al. (Apr. 1998) “A gray map reference pattern generator of a die-to-database mask inspection system for 256Mbit and 1Gbit DRAMs.” SPIE Conference on Photomask and X-Ray Mask Technology V. SPIE vol. 3412, pp. 544-551.
U.S. Appl. No. 11/276,426, filed Feb. 28, 2006, Isomura.

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