Die apparatus and method for high temperature forming of...

Metal deforming – By application of fluent medium – or energy field – Using fixed die

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C072S413000, C029S421100

Reexamination Certificate

active

07434432

ABSTRACT:
A bi-material die apparatus for high temperature forming of metal parts has at least two opposing die segments having inner surfaces together forming a hollow mold chamber for receiving a mold blank between the die segments. The die segments are of a first material having a first coefficient of thermal expansion CTE1. At least one insert of a second material is associated with the inner surface of at least one of the die segments so as to project into the mold chamber, the second material having a second coefficient of thermal expansion CTE2higher than CTE1and higher than the coefficient of thermal expansion of the metal product to be formed in the cavity.

REFERENCES:
patent: 3934441 (1976-01-01), Hamilton et al.
patent: 4984348 (1991-01-01), Cadwell
patent: 5823034 (1998-10-01), Nelepovitz
patent: 5974847 (1999-11-01), Saunders et al.
patent: 6581428 (2003-06-01), Friedman
patent: 7100259 (2006-09-01), Morales et al.
patent: 7112249 (2006-09-01), Schroth et al.
patent: 2003/0209047 (2003-11-01), Nelepovitz
“Coefficients of Linear Expansion”, Jul. 6, 2007, The Engineering Tool Box, www. Engineeringtoolbox.com, pp. 1 and 2.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Die apparatus and method for high temperature forming of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Die apparatus and method for high temperature forming of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Die apparatus and method for high temperature forming of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4006331

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.