Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1995-01-31
1996-03-26
Seidleck, James J.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430323, 430325, 430326, 430328, 430329, G11B 726, G03F 900
Patent
active
055019269
ABSTRACT:
A method of manufacturing a photomask for the production of dual depth features on substrates, and the photomask so manufactured, wherein the method of manufacturing the photomask is comprised of the steps of: (1) coating a substrate which transmits at least two selected wavelengths with: a) an optical filter material which prevents the transmission of at least one of the wavelengths, b) an opaque masking material, and c) a dual tone photoresist; (2) using a single mastering tool to selectively expose areas of the coated substrate to one of the wavelengths; (3) developing the photoresist; (4) etching the exposed masking material and optical filter material; (5) exposing the remaining coated substrate; (6) developing the remaining photoresist; (7) etching the exposed surface; and (8) stripping away the remaining photoresist.
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Horigome, et al., "Novel Stamper Process for Optical Disc," SPIE vol. 899, Optical Storage Technology and Applications (1988), pp. 123-128.
Hinsberg, et al., "A Lithographic Analog of Color Photography: Self-Aligning Photolithography using a Resist with Wavelength-Dependent Tone," IBM Optical Media, RJ6750 (64597) Mar. 29, 1989, Chemistry.
Cheng John C.
Reith Timothy M.
Wong James S.
International Business Machines - Corporation
Johnson R. F.
Millett Douglas R.
Seidleck James J.
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