Dibasic ester stripping composition

Details Dibasic ester stripping composition Dibasic ester stripping composition

1998-04-20

1999-06-08

Warden, Jill

Cleaning and liquid contact with solids

Processes

Paints, varnishes, lacquers, or enamels, removal

134 42, B08B 700, B08B 304

Patent

active

059097442

ABSTRACT:
A mixture of a dibasic ester (DBE), an alcohol, and water to remove photoresist from a silicon wafer substrate. Photoresist is effectively removed at ambient temperature with this non-phenolic, non-halogenated stripper solution. Dissolved photoresist is easily separated from the water mixture for disposal.

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