Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1987-10-08
1989-11-14
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430189, 430190, 430191, 430154, 430326, 430330, G03C 160
Patent
active
048807222
ABSTRACT:
The dissolution rate in alkaline developer solutions of image-wise exposed photoresist systems based on diazoquinone sensitized polyamic acid is reduced to prepare relief images of fine line resolution by reducing the acidity of the polyamic acid prior to exposure.
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De Forest, W. S., "Photoresist Materials and Processes", McGraw-Hill Book Co., 1975, pp. 147-149.
Chiong Kaolin N.
Moreau Wayne M.
Bowers Jr. Charles L.
International Business Machines - Corporation
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