Diazoquinone sensitized polyamic acid based photoresist composit

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430189, 430190, 430191, 430154, 430326, 430330, G03C 160

Patent

active

048807222

ABSTRACT:
The dissolution rate in alkaline developer solutions of image-wise exposed photoresist systems based on diazoquinone sensitized polyamic acid is reduced to prepare relief images of fine line resolution by reducing the acidity of the polyamic acid prior to exposure.

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