Diazonium salt and thermal recording material using the same

Details Diazonium salt and thermal recording material using the same Diazonium salt and thermal recording material using the same

2006-10-10

2006-10-10

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S176000, C430S183000, C430S184000, C430S185000, C430S186000, C534S560000

Reexamination Certificate

active

07118844

ABSTRACT:
A diazonium salt represented by the following general formula (1) and a thermal recording material using the diazonium salt:General Formula (1)wherein R1and R2each independently represents an alkyl group, an aryl group, an acyl group, an alkoxycarbonyl group or a carbamoyl group, and R1and R2may be linked each other to form a ring; and R3to R6each independently represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkylsulfonyl group, an arylsulfonyl group or a diazonio group, and at least one of R3, R4, R5and R6represents the diazonio group.

REFERENCES:
patent: 4540648 (1985-09-01), Scheler
patent: 5594145 (1997-01-01), Forstinger et al.
patent: 6017672 (2000-01-01), Arai et al.
patent: 223265 (1985-06-01), None
patent: 8-324129 (1996-12-01), None
patent: 11-78232 (1999-03-01), None

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