Diazo recording process and material

Gas separation: apparatus – Electric field separation apparatus – Electrode cleaner – apparatus part flusher – discharger – or...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Other Related Categories

96 7591D, 96 91R, G03C 534, G03C 160

Type

Patent

Status

active

Patent number

039855627

Description

ABSTRACT:
A diazo recording process which comprises the steps of (1) information-wise exposing to ultra-violet light and (2) overall heating a recording material comprising a compound yielding an amine on heating, an ultra-violet light-sensitive diazo compound and a coupling component capable of yielding a dyestuff by reaction with unaffected diazo compound when heating said material and wherein the compound yielding an amine on heating corresponds with the following general formula: ##EQU1## in which: R.sub.1 represents

REFERENCES:
patent: 2727820 (1955-12-01), Botkin et al.
patent: 2755185 (1956-07-01), Sulich et al.
patent: 2974042 (1961-03-01), Sus et al.
patent: 3113865 (1963-12-01), Sagura et al.
patent: 3199982 (1965-08-01), Kashiwabava
patent: 3255007 (1966-06-01), Kosav
patent: 3453112 (1969-07-01), Schaeffer
patent: 3493374 (1970-02-01), Roncken et al.
patent: 3563744 (1971-02-01), Poot et al.
patent: 3676140 (1972-07-01), Poot et al.
patent: 3794488 (1974-02-01), Herr et al.
Noller, C. R., "Textbook of Organic Chemistry," 2nd Ed. W. B. Saunders Co., 1958, pp. 180 and 243.
Kosar, J., "Light-Sensitive Systems," Wiley & Sons, 1965, pp. 219 and 295.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Diazo recording process and material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Diazo recording process and material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Diazo recording process and material will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-940046

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.