1981-02-13
1982-11-23
Hix, L. T.
354300, 354319, 34242, 29132, G03D 700
Patent
active
043602592
ABSTRACT:
A diazo developer is described which is useful for both ammonia vapor developing and for thermal developing. A heated chamber is provided with inlet and outlet slots through which the sheets pass during operation. Adjacent the inlet slot is a pair of inlet rollers that carry the sheets through the chamber. Adjacent the outlet slot is a pair of outlet rollers. At least some of the rollers are driven by a motor and one or more are preferably yieldably biased toward its mating roller, e.g. by the provision of a thin ribbon-shaped sealing strip engaged against the roller at a point opposite the nip or contact line between the rollers to yieldably bias them together while at the same time sealing the chamber against the leakage of vapor when used. Side plates are provided at the ends of the rollers and resilient gasket sheets formed from elastomeric material are compressed between the roll ends and the fixed side plates to seal the chamber. Heaters such as electrical resistance heaters are continuously supported along their length by the developing chamber wall. The rollers have metal interiors and elastomeric hose members engaged over the rollers elastically have precision ground surfaces that carry the sheets through the apparatus.
REFERENCES:
patent: Re26525 (1969-02-01), Wilde et al.
patent: 2172783 (1939-09-01), Alink et al.
patent: 2515144 (1950-07-01), Trump et al.
patent: 2918069 (1959-12-01), Brown et al.
patent: 3012492 (1961-12-01), Goodman et al.
patent: 3145637 (1964-08-01), Frantz
patent: 3435751 (1969-04-01), Goodman et al.
patent: 3496332 (1970-02-01), Lunde
patent: 3534673 (1970-10-01), Muller
patent: 3546363 (1970-12-01), Bricher et al.
patent: 3688082 (1972-08-01), Crane et al.
patent: 3724047 (1973-04-01), Peterson
patent: 3971115 (1976-07-01), Schneider et al.
patent: 4052732 (1977-10-01), Meadows
patent: 4056824 (1977-11-01), Iiyana et al.
patent: 4062031 (1977-12-01), Schroter
patent: 4147422 (1979-04-01), Kahle et al.
patent: 4148575 (1979-04-01), Siryj
patent: 4150992 (1979-04-01), Meadows et al.
patent: 4166688 (1979-09-01), Sachs
patent: 4167319 (1979-09-01), Feitzinger et al.
patent: 4181420 (1980-01-01), Blume et al.
patent: 4187023 (1980-02-01), Schausberger et al.
patent: 4199249 (1980-04-01), Welp et al.
patent: 4255037 (1981-03-01), Meadows et al.
patent: 4286859 (1981-09-01), Kurek
"Burgess Diazo and Thermal Film Developers", Burgess Industries.
Burgess Dennis A.
Rebers Kenneth D.
Harmon James V.
Hix L. T,.
Mathews Alan
LandOfFree
Diazo developing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Diazo developing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Diazo developing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1876885