Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1982-04-27
1983-11-22
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430160, 430176, G03C 152
Patent
active
044169671
ABSTRACT:
A one-component or binary type diazo copying element comprises a substrate, a pre-coat layer overlying the substrate, said pre-coat layer being consisted essentially of fine particle silica and a specific copolymer having a glass transition temperature in the range of -20.degree. C. to 50.degree. C., and a diazo photosensitive layer overlying the pre-coat layer.
REFERENCES:
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patent: 3520242 (1970-07-01), Kemp et al.
patent: 3733200 (1973-05-01), Takaishi et al.
patent: 3904414 (1975-09-01), Welch
patent: 4123276 (1978-10-01), Kita et al.
patent: 4128426 (1978-12-01), Ohta et al.
Hirabayashi Takeo
Matsuda Tsutomu
Sakurai Shinjiro
Yanagihara Takeshi
Bowers Jr. Charles L.
Ricoh Co. Ltd.
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