Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Patent
1996-09-09
1999-06-29
McCamish, Marion
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
216108, 216100, 216 52, 427585, 427294, 117929, 423446, 20419215, C23F 100
Patent
active
059164565
ABSTRACT:
A surface of a diamond, particularly a diamond window, is treated by depositing a layer of a carbide-forming metal such as titanium, on the surface and thereafter removing the layer. The treatment has the effect of passivating stress surface defects in the diamond such as grain boundaries, twin defects and polishing damage.
REFERENCES:
patent: 5270077 (1993-12-01), Knemeyer et al.
patent: 5336368 (1994-08-01), Iacovangelo et al.
patent: 5451430 (1995-09-01), Anthony et al.
patent: 5672395 (1997-09-01), Anthony et al.
Sweeney Charles Gerard
Whitehead Andrew John
Wort Christopher John Howard
Diamanx Products Limited
Juska Cheryl
McCamish Marion
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