Diamond synthesizing apparatus

Coating apparatus – Gas or vapor deposition – Multizone chamber

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Details

118723, 118715, 423466, 156DIG68, C23C 1600

Patent

active

050742450

ABSTRACT:
A diamond synthesizing apparatus has a reaction tube for internally causing a reaction for vapor-phase synthesizing diamond. A plasma generator produces the required microwave plasma in the reaction tube. The reaction tube is coupled with a gas reservoir, which forms a circulation system with the reaction tube. The circulation system is connectable to an exhaust for evacuating its interior. This circulation system further includes a pump for circulating raw material gas, which is a compound containing carbon. A raw material gas supply is also connectable to the circulation system, for intermittently supplying the raw material gas into the circulation system. During the synthesizing operation the circulation system is completely closed. According to this diamond synthesizing apparatus, it is possible to keep pressure fluctuations and composition fluctuations following a reaction and gas addition, to the minimum and to vapor-phase synthesize diamond in very restricted ranges of gas composition and pressure. Further, the consumption of the raw material gas is substantially reduced and the gas concentration in the reaction tube changes only very slowly and smoothly in gas supply, thus, an adverse influence caused by changes in the gas concentration on the film quality, is substantially eliminated.

REFERENCES:
patent: 3030187 (1962-04-01), Eversole
patent: 3030188 (1962-04-01), Eversole
patent: 4468283 (1984-08-01), Ahmed
patent: 4940015 (1990-07-01), Kobashi
USSR Inv. Certificate No.: 339134, 1958.
"Vapor Deposition of Diamond Particles from Methane", by Matsumoto et al.; Japanese Journal of Applied Physics, vol. 21, No. 4 (1982).
"Diamond Synthesis from Gas Phase in Microwave Plasma", by Kamo et al.; Journal of Crystal Growth 62 (1983) 642-644.

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