Diamond polishing method and apparatus employing oxygen-emitting

Details Diamond polishing method and apparatus employing oxygen-emitting Diamond polishing method and apparatus employing oxygen-emitting

1995-04-25

1997-10-07

Smith, James G.

Abrading

Abrading process

451 41, B24B 100

Patent

active

056741073

ABSTRACT:
A novel technique for fine polishing surfaces of diamond to the submicron level involves applying to the diamond surface an oxygen-emitting polishing medium, either a dry powder or a powder dispersed in a liquid carrier. The diamond surface is then polished by high speed rubbing to a submicron finish by inducing oxygen emission and oxygen-carbon interaction. Several embodiments of apparatus for polishing are described.

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