Active solid-state devices (e.g. – transistors – solid-state diode – Specified wide band gap semiconductor material other than... – Diamond or silicon carbide
Patent
1994-07-25
1995-07-11
Hille, Rolf
Active solid-state devices (e.g., transistors, solid-state diode
Specified wide band gap semiconductor material other than...
Diamond or silicon carbide
257 76, 338 22R, H01L 4900
Patent
active
054323576
ABSTRACT:
A pair of electrodes 3 are first formed on a substrate. Subsequently, an undoped diamond film is selectively deposited between the above electrodes. A B-doped diamond film is then selectively formed on both the insulating diamond film and part of each electrode. The substrate may be contained in a container provided with an opening portion from which only the B-doped diamond film is exposed.
REFERENCES:
patent: 3986196 (1976-10-01), Decker et al.
patent: 4359372 (1982-11-01), Nagai et al.
patent: 5066938 (1991-11-01), Kobashi et al.
patent: 5081438 (1992-01-01), Nakahata et al.
patent: 5099296 (1992-03-01), Mort et al.
patent: 5254862 (1993-10-01), Kalyankjumar et al.
patent: 5287003 (1994-02-01), Van Andel et al.
Kato Rie
Kobashi Koji
Hille Rolf
Kabushiki Kaisha Kobe Seiko Sho
Martin Wallace Valencia
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